ROHM’s High 8V Gate Withstand Voltage Marking Technology Breakthrough for 150V GaN HEMT
Solving the gate breakdown voltage problem of GaN devices contributes to lower power consumption and greater miniaturization of power supplies for base stations and data centers
Willich-Münchheide, Germany, May 27, 2021 – ROHM developed the industry’s highest (8V) gate breakdown voltage (rated gate-source voltage) technology for 150V GaN HEMT devices – optimized for power supply circuits in industrial and communication equipment.
(Fig. 1)

In recent years, due to the rising demand for server systems in response to the growing number of IoT devices, improving power conversion efficiency and reducing size have become important social issues that require further advancements in the power device sector.

Along with mass-producing industry-leading SiC devices and a variety of feature-rich silicon devices, ROHM has developed GaN devices featuring superior high frequency operation in the medium voltage range. Cultivating technology that increases the rated gate-source voltage allows ROHM to propose a wider range of power solutions for a variety of applications.

As GaN devices provide improved switching characteristics and lower ON resistance than silicon devices, they are expected to contribute to lower power consumption and greater miniaturization of switching power supplies used in base stations and data centers. However, drawbacks that include low rated gate-source voltage and overshoot voltage exceeding the max. rating during switching pose major challenges to device reliability.

In response, ROHM succeeded in raising the rated gate-source voltage from the typical 6V to 8V using an original structure. This makes it possible to both improve the design margin and increase the reliability of power supply circuits using GaN devices that require high efficiency. In addition to maximizing device performance with low parasitic inductance, we are also developing a dedicated package that facilitates mounting and delivers excellent heat dissipation, enabling easy replacement of existing silicon devices while simplifying handling during the mounting process.

Going forward, ROHM will accelerate the development of GaN devices based on this technology, with sample shipment planned for September 2021.
(Fig. 2 +3)

Application Examples
- 48V input buck converter circuits for data centers and base stations
- Boost converter circuits for the power amplifier block of base stations
- Class D audio amplifiers
- LiDAR drive circuits, wireless charging circuits for portable devices
(Fig. 4)
About ROHM Semiconductor

ROHM Semiconductor is a global company of 3.295 billion US dollars per March 31st, 2021 with 22,370 employees. The company develops and manufactures a very large product range from SiC Diodes and MOSFETs, Analog ICs such as Gate Drivers and Power Management ICs to Power Transistors and Diodes to Passive Components. The production of our high performing products is taking place in state-of-the-art manufacturing plants in Japan, Korea, Malaysia, Thailand, the Philippines, and China. LAPIS Semiconductor (former OKI Semiconductor), SiCrystal GmbH and Kionix are companies of the ROHM Semiconductor Group. ROHM Semiconductor Europe has its Head Office near Dusseldorf serving the EMEA region (Europe, Middle East and Africa). For further information, please contact www.rohm.com/eu
 
 
 
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Date: 27.05.2021 14:00
Number: 150V GaN-HEMT EN
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ROHM Semiconductor GmbH
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Katrin Haasis-Schmidt  
Karl-Arnold-Str. 15
D-47877 Willich-Münchheide
Germany
Phone: +49 2154 921 0
katrin.haasis-schmidt@de.rohmeurope.com
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